Contract processing service for oxide films on silicon wafers (for research, development, and mass production)
Prototype support, small quantity support, 4 to 12 inch support, optional film thickness (10nm to 20μm), substrate arrangement possible, support for supplied substrates, short delivery time.
Since our establishment, we have consistently processed oxide films on silicon wafers. We can accommodate everything from small lot prototypes to large-scale production quantities. Additionally, we offer thick film processing that cannot be matched by other companies, ensuring we meet all of our customers' needs. In particular, our unique thick film thermal oxidation film formation technology has become an essential material for optical devices that support optical communications, and our products and technologies are adopted by communication equipment manufacturers and optical component manufacturers worldwide.
- Company：セーレンＫＳＴ 本社
- Price：Other
